Zeiss Ultra Plus

Technical Specifications:

• Supply voltage: 0.02 – 30 kV
• Beam current: up to 100 nA
• Local charge compensation for generating images of non-conductive specimens
• In-lens secondary electron and EsB detectors
• Combined EDX/EBSD system for elemental analysis, as well as examination of material phases and textured surfaces

Phillips XL 40 ESEM TMP (now FEI Quanta 600)

Technische Spezifikation

• Operational Modes: 200 V (low-vacuum, up to 26 mbar) up to 30 kV (high-vacuum)
• ESEM (water vapor or atmospheric gas conditions)
• SE, BSE, and GSE detectors
• EDX system for elemental analysis
• EBSD for examination of material phases and textured surfaces
• Specimen chamber diameter: 379 mm

Applications

• Examination of surface structures in metallic specimens and in non-conductive, uncoated ceramic and polymer specimens
• Characterization of fracture surfaces
• Crack propagation analysis
• EDX-analysis: qualitative and quantitative determination of chemical/elemental composition of a specimen (layer structure, percentage distribution of individual elements)
• EBSD-analysis: characterization of grain size and local textured surfaces, identification of phases and their distribution, fracture analysis